Patterning LDI Equipment

Training Certificate Inquiry

Advantages
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High Precision
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Advanced Functionality
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High Throughput
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Smart System
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High Precision
Alignment accuracy: ±5 μm
Minimum line width/spacing: 4/4 μm
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Advanced Functionality
Zone alignment & shrinkage compensation
Automated accuracy measurement
Real-time energy fluctuation compensation, reducing manual intervention
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High Throughput
30% faster data processing with next-gen DMD control technology
50% faster alignment via high-speed flying exposure
Equipped with a high-power laser up to 100W
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Smart System
Customizable MES for real-time equipment monitoring
PC/mobile alerts and notifications
PRODUCT SPECIFICATIONS
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TZDI-40
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TZDI-35
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TZDI-25
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TZDI-12
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Platform Type
Dual-table
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Maximum Exposure Area
630 mm × 810 mm
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Substrate Thickness
0.025 - 6 mm
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Minimum Line Width/Spacing
40 μm
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Typical Production Line Width/Spacing(μm)
60 μm
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Line Width Tolerance
±10%
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Alignment Accuracy
±12 μm
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Interlayer Registration Accuracy
24 μm
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Depth of Field
±300 μm
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Single-Machine Throughput
8.5 s/side @20 mJ/cm²
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Automatic Line Throughput
7 s/pnl @20 mJ/cm²
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Recommended Applications
MLB (inner & outer layers), Ceramic Substrate
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Platform Type
Dual-table
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Maximum Exposure Area
630 mm × 810 mm
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Substrate Thickness
0.025 - 6 mm
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Minimum Line Width/Spacing
35 μm
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Typical Production Line Width/Spacing
50 μm
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Line Width Tolerance
±10%
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Alignment Accuracy
±10 μm
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Interlayer Registration Accuracy
20 μm
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Depth of Field
±300 μm
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Single-Machine Throughput
8.5 s/side @20mj/cm²
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Automatic Line Throughput
7 s/ pnl @20mj/cm²
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Recommended Applications
MLB (inner & outer layers), Ceramic Substrate
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Platform Type
Dual-table
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Maximum Exposure Area
630 mm × 850 mm
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Substrate Thickness
0.025 to 6 mm
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Minimum Line Width/Spacing
25 μm
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Typical Production Line Width/Spacing
40 μm
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Line Width Tolerance
±10%
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Alignment Accuracy
±10 μm
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Interlayer Registration Accuracy
20 μm
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Depth of Field
±200 μm
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Single-Machine Throughput
10 s/side @20mj/cm²
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Automatic Line Throughput
8 s/pnl @20mj/cm²
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Recommended Applications
MLB(inner & outer layers), HDI
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Platform Type
Dual-table
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Maximum Exposure Area
630 mm × 810 mm
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Substrate Thickness
0.025 to 6 mm
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Minimum Line Width/Spacing
12 μm
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Typical Production Line Width/Spacing
20 μm
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Line Width Tolerance
±10%
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Alignment Accuracy
±7 μm
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Interlayer Registration Accuracy
16 μm
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Depth of Field
±150 μm
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Single-Machine Throughput
12 s/side @20mj/cm²
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Automatic Line Throughput
12 s/pnl @20mj/cm²
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Recommended Applications
IC Substrate, SLP
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