Spector Mask Critical Dimension Measurement System

Spector is a premium optical metrology system specifically engineered for Critical Dimension (CD) measurement in semiconductor mask manufacturing. it supports mask size up to 14 inch and comprehensively meets measurement requirements for photomasks utilized for the 65nm process node.

The system features an optional UV light source with special optimized optical component, ensuring CD measurement repeatability better than 1.5nm. This delivers the high stability and consistency required for advanced process control. Its fully enclosed design incorporates SMIF compatibility and fully automated handling capability, enabling reliable operation in cleanroomand and aligning with automated production needs.

Integrated with SECS/GEM communication protocols, Spector facilitates seamless integration into Fab automation systems, empowering customers to achieve highly automated and intelligent photomask manufacturing workflows.