MT270UV
Mask Critical Dimension Measurement System - UV Optical Metrology Solution for Advanced Mask Manufacturing
MT270UV is a high-performance optical measurement system specifically designed for Critical Dimension (CD) measurement in semiconductor mask manufacturing. it supports mask size up to 9 inch and comprehensively meets measurement requirements for photomasks utilized for the 65nm process node.
Featuring a highly stable UV light source and an optimized optical measurement system, the MT270UV delivers exceptional CD measurement repeatability better than 2nm, ensuring highly consistent and reliable measurement results.
With over 20 years of technical expertise and continuous improvements, MT270UV has been widely adopted and validated by global leading photomask manufacturers, recogzing itself as the CD measurement baseline solution. Its mature, stabilit and reliable performance provide solid foundation for quality control throughout the photomask manufacturing process.
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Advantages
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High-Precision Measurement
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Flexible and User-Friendly
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Proven, Stable, and Reliable
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High-Precision MeasurementDelivers repeatability accuracy down to 2 nm
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Flexible and User-FriendlyEquipped with GDS functionality for convenient and user-friendly operation
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Proven, Stable, and ReliableLow cost of ownership, easy to maintain, free from short-cycle consumables, and delivers long-term stability and reliability
