Mask Critical Dimension (CD) Metrology System
High-Precision Optical Metrology Platform for Advanced Photomask Manufacturing
The Spector is a high-end optical metrology system designed for Critical Dimension (CD) metrology in semiconductor photomask manufacturing. It supports photomasks up to 14 inches, meeting the measurement requirements of process nodes down to 65 nm.
The system features an optional UV illumination source and optimized optical components, delivering CD measurement repeatability better than 1.5 nm while ensuring the stability and measurement consistency required for advanced process control.
Its fully enclosed design supports SMIF interfaces and fully automated handling for reliable cleanroom operation. Support for the industry-standard SECS/GEM protocol enables seamless integration with fab automation systems, facilitating highly automated and intelligent photomask manufacturing.
The system features an optional UV illumination source and optimized optical components, delivering CD measurement repeatability better than 1.5 nm while ensuring the stability and measurement consistency required for advanced process control.
Its fully enclosed design supports SMIF interfaces and fully automated handling for reliable cleanroom operation. Support for the industry-standard SECS/GEM protocol enables seamless integration with fab automation systems, facilitating highly automated and intelligent photomask manufacturing.
Scroll to explore
Advantages
-
High-Precision Metrology
-
Flexible and Easy to Use
-
Proven and Reliable
-
High-Precision MetrologyMeasurement repeatability down to 1.5 nm
-
Flexible and Easy to UseSupports SMIF and fully automated wafer handling
-
Proven and ReliableLow Cost of Ownership, easy maintenance, and no consumables requiring regular replacement
