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Brightfield Inspection

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INDUSTRY SOLUTION

Designed to address the inspection challenges in memory processes, TZTEK's brightfield defect inspection solution integrates multiple technologies to support high-precision in-line inspection of thick films and high-density memory structures.

  • The system supports an extended focus range, improving inspection coverage and defect detection within thick film layers.

  • A minimum inspection pixel size of 36 nm enhances small-defect detection, while a 3 × 3 pixel high-precision scan region improves detection accuracy and reduces noise.

  • The system supports multi-material optical simulation and full-wave time-domain simulation based on actual process structures, covering wavelengths from 260–600 nm to optimize inline inspection.

  • A high-speed motion stage synchronizes continuous motion with TDI to reduce step-and-settle time. Combined with HPC, it improves data processing efficiency for stable, high-precision, high-throughput production.

KEY ADVANTAGES

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    AI Algorithms & Data Analytics: Intelligent inspection, noise suppression, and support for diverse applications.

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    Large Focus Range Inspection: Extended Z-axis travel accommodates a wide range of focus requirements.

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    Optical Simulation & Design: Professional simulation engines and comprehensive material libraries enable rapid optical design iteration and optimization.

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    High-Speed Precision Motion Stage: Faster motion improves overall inspection throughput.

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    GDS ROI Technology: Higher ROI accuracy with lower inspection noise.

RELATED SOLUTIONS

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