MT270UV Mask Critical Dimension (CD) Metrology System
High-Precision UV Optical Metrology Solution for Advanced Photomask Manufacturing
The MT270UV is a high-performance optical metrology system specifically designed for Critical Dimension (CD) metrology in semiconductor photomask manufacturing. It supports photomasks up to 9 inches, meeting the measurement requirements of process nodes down to 65 nm.
Featuring a highly stable UV illumination source and optimized optics, the MT270UV delivers CD measurement repeatability better than 2 nm, ensuring highly consistent and reliable measurement results. The MT270UV has been widely adopted and validated by leading photomask manufacturers worldwide, enabling reliable quality control across the photomask manufacturing process.
Featuring a highly stable UV light source and an optimized optical measurement system, the MT270UV delivers exceptional CD measurement repeatability better than 2nm, ensuring highly consistent and reliable measurement results.
Featuring a highly stable UV illumination source and optimized optics, the MT270UV delivers CD measurement repeatability better than 2 nm, ensuring highly consistent and reliable measurement results. The MT270UV has been widely adopted and validated by leading photomask manufacturers worldwide, enabling reliable quality control across the photomask manufacturing process.
Featuring a highly stable UV light source and an optimized optical measurement system, the MT270UV delivers exceptional CD measurement repeatability better than 2nm, ensuring highly consistent and reliable measurement results.
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Advantages
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High-Precision Metrology
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Flexible and Easy to Use
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Proven and Reliable
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High-Precision MetrologyMeasurement repeatability down to 2 nm
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Flexible and Easy to UseIntegrated GDS support for intuitive and efficient operation
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Proven and ReliableLow Cost of Ownership, easy maintenance, and no consumables requiring regular replacement
